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Research Project 4: Advanced nanopatterning for EUV thermal and acoustic nanometrologies
Thermal properties of materials at the nanoscale behave much differently than their macroscale counterparts. Researchers are using electron beam lithography to fabricate a variety of nanostructures of different substrates for EUV thermal and acoustic nanometrologies to understand this behavior. This will help better understand the design challenges of the next generation of microprocessors or quantum computers.

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  • Jeff Jessing

    Lead

  • Margaret Murnane

    Lead

  • Andrew Minor

    Lead

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National Science Foundation
Any opinions, findings and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.