Nicolas Gaillard (PhD, Micro- and Nano-electronics, Joseph Fourier University, Grenoble, France) has over 15 years of experience in materials science, with an emphasis in the areas of photovoltaics, photoelectrochemical hydrogen production and integrated circuits.  Following his graduate work, Dr. Gaillard spent 3 years with the IBM/Motorola/STMicroelectronics alliance working on oxide/metal interfaces for CMOS transistors and DRAM memories applications. 

He joined the Thin Films Laboratory of the Hawai‘i Natural Energy Institute at the University of Hawai‘i at Mānoa in 2007 as a post-doctoral, working under the supervision of Dr. Eric Miller on metal oxide thin films for photoelectrochemical hydrogen production.  Dr. Gaillard was appointed faculty and Thin Films Laboratory group leader in 2010. 

Research Description

My research activity is dedicated to photoelectrochemical processes, solid/liquid interface engineering and surface photocatalysis for solar fuels generation. My group is also looking at new (non vacuum-based) fabrication methods to synthesized thin film solar absorbers and quantum dots for photovoltaic applications.

Positions

Assistant Researcher
University of Hawaii (UH) at Manoa
2007

Education

Ph.D. (Physics) Micro and Nanoelectronics
Joseph Fourier University, France
2006
Engineering (Optoelectronics)
National Grad. School of Physics, France
2002
M.S. (Physics) Micro and Nanoelectronics
Joseph Fourier University, France
2002
B.S. (Materials Science)
Grenoble Institute of Technology, France
2000